@ARTICLE{Wróbel_Joanna_Fabrication_2017,
 author={Wróbel, Joanna and Bobko, E. and Płoch, Dariusz and Wiater, M. and Wojtowicz, T.},
 volume={vol. 25},
 number={No 2},
 journal={Opto-Electronics Review},
 pages={65-68},
 howpublished={online},
 year={2017},
 publisher={Polish Academy of Sciences (under the auspices of the Committee on Electronics and Telecommunication) and Association of Polish Electrical Engineers in cooperation with Military University of Technology},
 abstract={In this work we report on fabrication of quantum wires and quantum point contacts from the modulation doped CdMgTe/Cd(Mn)Te structures, with the application of a high-resolution electron-beam lithography. We emphasize on methods which were not yet utilized for these substrate materials. In particular, we describe the so-called shallow-etching approach, which allows for the fabrication of quantum constrictions of a physical width down to 100 nm, which are characterized by the smoother confining potential as compared to the deep-etched devices. For that purpose, a single-line exposure mode of electron-beam lithography has been used. We demonstrate also, how to combine the etching of separating grooves with the thermal evaporation of metal side-gates into a single post-processing stage of a quantum point contact fabrication. This article is an expanded version of the scientific reports presented at the International Conference on Semiconductor Nanostructures for Optoelectronics and Biosensors 2016 ICSeNOB2016, May 22–25, 2016, Rzeszow, Poland.},
 type={Article},
 title={Fabrication of CdMgTe/Cd(Mn)Te nanostructures with the application of high-resolution electron-beam lithography},
 URL={http://ochroma.man.poznan.pl/Content/115348/PDF/main.pdf},
 keywords={Nanopatterning, Electron beam lithography, Wet etching, Side gate},
}