Title

Temperature Effect on the Growth Rate and Physical Characteristics of SnO2 Thin Films Grown by Atomic Layer Deposition

Journal title

Archives of Metallurgy and Materials

Yearbook

2018

Volume

vol. 63

Issue

No 2

Authors

Kim, Daeho ; Kim, Dong Ha ; Riu, Doh-Hyung ; Choi, Byung Joon

Keywords

atomic layer deposition ; tin oxide ; growth rate ; film density ; optical band gap

Divisions of PAS

Nauki Techniczne

Publisher

Institute of Metallurgy and Materials Science of Polish Academy of Sciences ; Committee of Materials Engineering and Metallurgy of Polish Academy of Sciences

Date

2018.06.30

Type

Artykuły / Articles

Identifier

DOI: 10.24425/122443 ; e-ISSN 2300-1909

Source

Archives of Metallurgy and Materials; 2018; vol. 63; No 2