Tytuł artykułu

Dissolution Behavior of Metal Impurities and Improvement of Reclaimed Semiconductor Wafer Cleaning by Addition of Chelating Agent

Tytuł czasopisma

Archives of Metallurgy and Materials

Rocznik

2021

Wolumin

vol. 66

Numer

No 4

Afiliacje

Ryu, Keunhyuk : Dankook University, Department of Energy Engineering, Cheonan 31116, Republic of Korea ; Kim, Myungsuk : Dankook University, Department of Energy Engineering, Cheonan 31116, Republic of Korea ; Roh, Jaeseok : Dankook University, Department of Energy Engineering, Cheonan 31116, Republic of Korea ; Lee, Kun-Jae : Dankook University, Department of Energy Engineering, Cheonan 31116, Republic of Korea

Autorzy

Ryu, Keunhyuk ; Kim, Myungsuk ; Roh, Jaeseok ; Lee, Kun-Jae

Słowa kluczowe

Reclaimed silicon wafer ; Wafer cleaning ; Metal impurity ; Metal complex ; Chelating agent

Wydział PAN

Nauki Techniczne

Zakres

977-981

Wydawca

Institute of Metallurgy and Materials Science of Polish Academy of Sciences ; Committee of Materials Engineering and Metallurgy of Polish Academy of Sciences

Bibliografia

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[12] N. Zubair, K. Akhtar, Trans. Nonferrous Met. Soc. China 29 (1), 143-156 (2019).
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Data

2021.12.28

Typ

Article

Identyfikator

DOI: 10.24425/amm.2021.136409 ; e-ISSN 2300-1909

Źródło

Archives of Metallurgy and Materials