Title

The use of one-component plasma in the icp-rie etching process of periodic structures for applications in photodetector arrays

Journal title

Metrology and Measurement Systems

Yearbook

2023

Volume

vol. 30

Issue

No 4

Affiliation

Różycka, Marta : Łukasiewicz Research Network – Institute of Microelectronics and Photonics, 32/46 Lotników Avenue, 02-668, Warsaw, Poland ; Jasik, Agata : Łukasiewicz Research Network – Institute of Microelectronics and Photonics, 32/46 Lotników Avenue, 02-668, Warsaw, Poland ; Kozłowski, Paweł : Łukasiewicz Research Network – Institute of Microelectronics and Photonics, 32/46 Lotników Avenue, 02-668, Warsaw, Poland ; Bracha, Krzysztof : Łukasiewicz Research Network – Institute of Microelectronics and Photonics, 32/46 Lotników Avenue, 02-668, Warsaw, Poland ; Ratajczak, Jacek : Łukasiewicz Research Network – Institute of Microelectronics and Photonics, 32/46 Lotników Avenue, 02-668, Warsaw, Poland ; Różycka, Marta : Institute of Metallurgy and Materials Science, Polish Academy of Sciences, 25 Reymonta Street, 30-059, Kraków, Poland ; Wierzbicka-Miernik, Anna : Institute of Metallurgy and Materials Science, Polish Academy of Sciences, 25 Reymonta Street, 30-059, Kraków, Poland

Authors

Różycka, Marta ; Jasik, Agata ; Kozłowski, Paweł ; Bracha, Krzysztof ; Ratajczak, Jacek ; Wierzbicka-Miernik, Anna

Keywords

ICP-RIE ; dry etching ; type II InAs/GaSb superlattice ; BCl3

Divisions of PAS

Nauki Techniczne

Coverage

809-819

Publisher

Polish Academy of Sciences Committee on Metrology and Scientific Instrumentation

Date

20.11.2023

Type

Article

Identifier

DOI: 10.24425/mms.2023.147955