Tytuł artykułu

Application of Al ₂O ₃ ZnO, and TiO ₂ ALD thin films as antireflection coating in the silicon solar cells

Tytuł czasopisma

Opto-Electronics Review

Rocznik

2023

Wolumin

31

Numer

4

Autorzy

Szindler, Marek ; Szindler, Magdalena M.

Afiliacje

Szindler, Marek : Scientific and Didactic Laboratory of Nanotechnology and Material Technologies, Faculty of Mechanical Engineering, Silesian University of Technology, ul. Towarowa 7, 44-100 Gliwice, Poland ; Szindler, Magdalena M. : Department of Engineering Materials and Biomaterials, Faculty of Mechanical Engineering, Silesian University of Technology, ul. Konarskiego 18a, 44-100 Gliwice, Poland

Słowa kluczowe

optical thin film ; antireflection coating ; atomic layer deposition ; solar cells

Wydział PAN

Nauki Techniczne

Zakres

e148223

Wydawca

Polish Academy of Sciences (under the auspices of the Committee on Electronics and Telecommunication) and Association of Polish Electrical Engineers in cooperation with Military University of Technology

Data

05.11.2023

Typ

Article

Identyfikator

DOI: 10.24425/opelre.2023.148223 ; ISSN 1896-3757

Indeksowanie w bazach

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