Details
Title
Numerical Simulation of O3 and NO Reacting in a Tubular Flow ReactorJournal title
Chemical and Process EngineeringYearbook
2013Issue
No 3 SeptemberAuthors
Keywords
numerical modelling ; global mechanism ; de-NOx ; nitric oxide ; ozonationDivisions of PAS
Nauki TechniczneCoverage
361-373Publisher
Polish Academy of Sciences Committee of Chemical and Process EngineeringDate
2013Type
Artykuły / ArticlesIdentifier
DOI: 10.2478/cpe-2013-0029 ; ISSN 2300-1925 (Chemical and Process Engineering)Source
Chemical and Process Engineering; 2013; No 3 September; 361-373Editorial Board
Editorial Board
Ali Mesbah, UC Berkeley, USA 
0000-0002-1700-0600
Anna Gancarczyk, Institute of Chemical Engineering, Polish Academy of Sciences, Poland 0000-0002-2847-8992
Anna Trusek, Wrocław University of Science and Technology, Poland 0000-0002-3886-7166
Bettina Muster-Slawitsch, AAE Intec, Austria 0000-0002-5944-0831
Daria Camilla Boffito, Polytechnique Montreal, Canada 0000-0002-5252-5752
Donata Konopacka-Łyskawa, Gdańsk University of Technology, Poland 0000-0002-2924-7360
Dorota Antos, Rzeszów University of Technology, Poland 0000-0001-8246-5052
Evgeny Rebrov, University of Warwick, UK 0000-0001-6056-9520
Georgios Stefanidis, National Technical University of Athens, Greece 0000-0002-4347-1350
Ireneusz Grubecki, Bydgoszcz Univeristy of Science and Technology, Poland 0000-0001-5378-3115
Johan Tinge, Fibrant B.V., The Netherlands 0000-0003-1776-9580
Katarzyna Bizon, Cracow University of Technology, Poland 0000-0001-7600-4452
Katarzyna Szymańska, Silesian University of Technology, Poland 0000-0002-1653-9540
Marcin Bizukojć, Łódź University of Technology, Poland 0000-0003-1641-9917
Marek Ochowiak, Poznań University of Technology, Poland 0000-0003-1543-9967
Mirko Skiborowski, Hamburg University of Technology, Germany 0000-0001-9694-963X
Nikola Nikacevic, University of Belgrade, Serbia 0000-0003-1135-5336
Rafał Rakoczy, West Pomeranian University of Technology, Poland 0000-0002-5770-926X
Richard Lakerveld, Hong Kong University of Science and Technology, Hong Kong 0000-0001-7444-2678
Tom van Gerven, KU Leuven, Belgium 0000-0003-2051-5696
Tomasz Sosnowski, Warsaw University of Technology, Poland 0000-0002-6775-3766